Editorial Reviews
Book Description
The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm. Some of the challenges are materials-related, such as transistors with high-k dielectrics and on-chip interconnects made from copper and low-k dielectrics. The magnitude of these challenges demands special attention from those in the metrology and analytical measurements community. Characterization and metrology are key enablers for developing semiconductor process technology and in improving manufacturing.This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of the process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics.It provides a concise and effective portrayal of industry characterization needs and some of the problems that must be addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. It also provides a basis for stimulating practical perspectives and new ideas for research and development.
Book Info
Proceedings of the International Conference on Characterization and Metrology for ULSI Technology, held in Gaithersburg, Maryland, June 26-29, 2000. Topics covered included front end processes, contamination and defect analysis, and lithography. Includes a CD-ROM for use with the text. System requirements not listed.
Characterization and Metrology for ULSI Technology 2000: International Conference (AIP Conference Proceedings),David G. Seiler,Alain C. Diebold,Thomas J. Shaffner,Robert McDonald,W. Murray Bullis,Patrick J. Smith,Erik M. Secula,American Institute of Physics,156396967X,Astronomy - General,Congresses,Electronics - Circuits - VLSI,Electronics - Semiconductors,Engineering - Industrial,General,Integrated circuits,Science,Science/Mathematics,Semiconductors,Software,Solid State Physics,Technology,Ultra large scale integration,Very-Large-Scale Integration (Vlsi),Circuits & components,General Theory of Computing,Semi-conductors & super-conductors,Technology / Material Science,materials characterization,metrology,nanoscale fabrication,semiconductor manufacturing
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